Lowest Price for Co2 Laser Marking Machine Price China - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system

Lowest Price for Co2 Laser Marking Machine Price China - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS

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Lowest Price for Co2 Laser Marking Machine Price China - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS Detail:

Product Description

Dynamic scanning optical system optics:1pc small focus lens、1-2pcs focus lens、Galvo mirror.The entire optical lens forms a function of beam expansion, focusing and beam deflection and scanning.
The expanding part is a negative lens, ie small focus lens, which realizes beam expansion and moving zoom, the focusing lens is composed of a group of positive lenses. The galvo mirror is mirror in the galvanometer system.

Product Advantage:

(1) Optimization of lens design: Optimum ratio of diameter to thickness ratio
(2) Lens high damage threshold:>30J/cm2 10ns
(3) Ultra-low absorption coating, absorption rate:<20ppm
(4) Galvanometer thickness to diameter ratio: 1：35
(5) Lens surface accuracy:<= λ/5

Technical Parameters:

Post-Objective Lens

Max Entrance Pupil (mm)	Optics 1 Diameter(mm)	Optics 2 Diameter(mm)	Optics 3 Diameter(mm)	Scan Field (mm)	Clear Aperture of Scanner (mm)	Wavelength
8	15	55	55	600×600 800×800	30	10.6um
12	22	55	55	1600×1600	30	10.6um
8	16	55	55	600×600 800×800	30	1030-1090nm
8	15	35	35	300×300	10	532nm
8	15	35	35	300×300	10	355nm

Reflector Mirror

Part Description	Diameter(mm)	Thickness(mm)	Material	Coating
Silicon Reflector	25.4	3	Silicon	HR@10.6um, AOI: 45°
Silicon Reflector	30	4	Silicon	HR@10.6um, AOI: 45°
Fiber Reflector	25.4	6.35	Fused Silica	HR@1030-1090nm，AOI: 45°
Fiber Reflector	30	5	Fused Silica	HR@1030-1090nm，AOI: 45°
Fiber Reflector	50	10	Fused Silica	HR@1030-1090nm，AOI: 45°
532 Reflector	25.4	6	Fused Silica	HR@515-540nm/532nm, AOI: 45°
532 Reflector	25.4	6.35	Fused Silica	HR@515-540nm/532nm, AOI: 45°
532 Reflector	30	5	Fused Silica	HR@515-540nm/532nm, AOI: 45°
532 Reflector	50	10	Fused Silica	HR@515-540nm/532nm, AOI: 45°
355 Reflector	25.4	6	Fused Silica	HR@355nm&433nm, AOI: 45°
355 Reflector	25.4	6.35	Fused Silica	HR@355nm&433nm, AOI: 45°
355 Reflector	25.4	10	Fused Silica	HR@355nm&433nm, AOI: 45°
355 Reflector	30	5	Fused Silica	HR@355nm&433nm, AOI: 45°

Galvo Mirror

Part Description	Max Entrance Pupil (mm)	Material	Coating	Wavelength
55mmL35mmW3.5mmT-X 62mmL43mmW3.5mmT-Y	30	Silicon	MMR@10.6um	10.6um
55mmL35mmW3.5mmT-X 62mmL43mmW3.5mmT-Y	30	Fused Silica	HR@1030-1090nm	1030-1090nm
55mmL35mmW3.5mmT-X 62mmL43mmW3.5mmT-Y	30	Fused Silica	HR@532nm	532nm
55mmL35mmW3.5mmT-X 62mmL43mmW3.5mmT-Y	30	Fused Silica	HR@355nm	355nm

Protective Lens

Diameter(mm)	Thickness (mm)	Material	Coating
75	3	ZnSe	AR/AR@10.6um
80	3	ZnSe	AR/AR@10.6um
90	3	ZnSe	AR/AR@10.6um
90×60	5	ZnSe	AR/AR@10.6um
90×64	2.5	ZnSe	AR/AR@10.6um
90×70	3	ZnSe	AR/AR@10.6um

Operational Principle

Product detail pictures:

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Our company since its inception, constantly regards product or service high quality as business life, continually improve creation technology, make improvements to product high-quality and consistently strengthen business total high-quality management, in strict accordance together with the national standard ISO 9001:2000 for Lowest Price for Co2 Laser Marking Machine Price China - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS , The product will supply to all over the world, such as: Juventus, Turkey, Japan, With the effort to keep pace with world's trend, we'll always endeavor to meet customers' demands. If you want develop any other new items, we can customize them to suit your needs. If you feel interest in any of our products and solutions or want develop new merchandise, you should feel free to contact us. We are looking forward to forming successful business relationship with customers all over the world.

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